CuInS2 thin films obtained through the annealing of chemically deposited In2S3–CuS thin films
نویسندگان
چکیده
منابع مشابه
Study of Composition and Optical Properties of Chemically Deposited Pd-xSb2S3 Thin Films
The study reports on the effects of different concentration of palladium impurities on the compositional and optical properties of Palladium Doped Antimony Sulphide (Pd-xSb2S3) thin films grown by the chemical bath deposition method. The films were grown at room temperature and other deposition conditions such as the bath temperature, pH, complexing agents were kept constant. The concentration ...
متن کاملEnhanced methanol sensing performance of oblique deposited WO3 thin films
Methanol (CH3OH) is a colorless liquid with a mild odor. The wide ranges of applications, toxicity and clinical implications of methanol have made necessary to develop reliable and high-performance methanol sensors. In this paper, WO3 thin films were deposited on SiO2/Si substrates by e-beam evaporation technique under normal and oblique angles and then post-annealed at 500 °C with a flow of ox...
متن کاملCharacterization of Spray Pyrolysed CuInS2 Thin Films
An indigenously developed chemical spray pyrolysis system was used to deposit polycrystalline CuInS2 thin films. It was found that smaller spray rate results in films with better crystallinity and lower resistivity. Increase in surface roughness of the films was observed for higher spray rates. Variations in film stoichiometry with composition of spray solution were analyzed along with its opto...
متن کاملPhysical Properties of Reactively Sputter-Deposited C-N Thin Films
This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...
متن کاملStructural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films
Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Applied Surface Science
سال: 2011
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2010.09.071